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KSV 3000 is available in two fixed configurations either as a conventional film balance or as a Langmuir-Blodgett instrument for film depositions.
 

KSV 3000 FB - Film balance

The trough and the barrier driving system are located inside a sturdy cabinet to provide a clean and disturbance free atmosphere. The electronic film balance is located on top of the cabinet. The trough and barriers are easily and fast removed for cleaning. Subphase water of the trough is controlled by running thermostatted water inside the aluminium base heat plate.
 

KSV 3000 LB - Langmuir deposition instrument

KSV 3000 LB is intended for unsupervised and computer controlled Langmuir-Blodgett film depositions and for conventional Langmuir film experiments. Vitally important to successful Langmuir-Blodgett film deposition is the instruments capability to maintain the orientation of the molecules during the transfer of the film from air/water interface on to a solid substrate.

Symmetric compression achieved by two inwardly moving barriers and film deposition right at the centre of film compression ensures that the molecular arrangement of the film will not be altered during deposition process.

The troughs are made of cast moulded solid piece of purified PTFE. Dipping well is integral part of the trough and no glue or compression seals with PTFE or silicon o-rings are used to fasten the dipping well into the trough. Barriers are made of hydrophilic material in order to provide leak proof film compression. Because of hydrophilic barriers it not necessary to overfill the trough but the water level can be kept even below the edges of the trough for greater surface pressures and for eliminating film leakage.
 

Symmetric Compression

Symmetric compression of monolayer by two inwardly moving barriers offers several advantages over the traditional single barrier film compression systems.

Symmetric compression causes minimal film flow increasing the accuracy of the film pressure measurement. The Wilhelmy plate is evenly compressed from both sides and no shifting will occur even with stiffest films.

Since the dipping of substrate is performed at the centre of film compression where the monolayer is uniformly oriented the orientation of the molecules will not be altered during the transfer from water/air interface onto a substrate. Both sides of substrates are coated evenly and no back drag encountered with single barrier systems will occur. In addition, possible parabolic film flow pattern (centre moving faster than sides) often causing major distortion with single barrier systems and with condensed films is minimised due to symmetric compression.

Film compression with two barriers results in relative barrier speeds to drop to half of that of one barrier systems. Reduced barrier speed leads to reduced share resistance, an important factor with condensed films.
 

Software

KSV 3000 is run by a powerful and flexible multi tasking software allowing you to create complex measurement sequences with out software modifications. The software includes ready written and menu driven programmes which cover most of known LB-film experiments. No reprogramming is needed and the user is directed trough the set up programs step by step.

Standard programs include:

• Compression/relaxations isotherms - vs mma,
  vs time or vs any desired measurable factor
• Transfer ratio and deposition profiles
• Analysis of enzyme kinetics and enzyme penetration
• Analysis of hydrolysis of monolayers
• Isochores and isobars
• Constant increase/decrease of vs mma, vs time
  or vs any desired measurable factor

Specifications
 

Film deposition system
 

Control and operation	Software controlled unsupervised and automatic film depositions. User programmable deposition parameters.
Deposition	Standard range to 85 mm/min. Speed adjustment increment 0,1 speed mm. Optional range 2 to 170 mm/min.
Deposition cycles	1 to unlimited depositions.
Dwell times	0 to 9999 s, individual adjustment for upper and lower dwell time
Max. Size	100x100 mm (100% immersion) of substrate
Dipper motor	Servo controlled DC motor
Deposition	Max. length of deposition arm stroke 170 mm stroke

 

Film pressure measuring system
 

Measuring principle	Wilhelmy plate method, platinum or paper sensor element connected microelectronic feedback system for surface pressure control. Software controlled operation, user programmable process parameters.
Dynamic range	0 to 125 mN/m
Resolution	4 µN/m

 

Film area control system
 

Surface area regulation	Symmetric compression of monolayer by two moving barriers. Software controlled operation and user programmable process parameters.
Surface barriers	Made of hydrophilic, optionally hydrophobic material. Leakage proof.
Compression speed	0.01 to 800 mm/min
Barrier drive	Belt drive powered by high precision microstep stepper motor
Inaccuracy	Less than 1%

 

Trough
 

Material	Solid, non porous cast moulded PTFE with integrated dipping well. No glue or O-ring seals. Aluminium base plate with built in water channels for temperature control of the subphase water. PTFE thickness at trough bottom 1.15 mm.
Size	510 x 150 x 10 mm. Dipping well in centre of trough and perpendicular to barrier movement. Max. size of substrate 100 x 100 mm
Subphase volume	0,95 l with dipping well 0,75 l with out well

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